Lower operating costs • Extend time between wet cleans • Lower process kit part usage
Cleaning Products for Wafer Tooling
Etch CleanTM for Etch Tools • Removes debris on the chuck that causes He leak faults
Stage CleanTM for Litho Tools • Removes debris on the chuck that causes defocus errors
Sputter Clean for PVD Tools • Removes debris on the chuck that causes defocus errors
Prober Clean for Wafer Prober • Removes debris on the chuck that causes wafer backside damage
Wafer Chuck Cleaning Wafer
Stage CleanTM is a Si wafer with a proprietary, engineered sticky polymer film that removes particles from vacuum chucks, eliminating hotspots.
Etch CleanTM is a Si wafer coated with a proprietary tacky polymer film that removes particles from electrostatic chucks.
ITS Chuck Cleaning Wafer (CCW) is applicable to all wafer handling tools including prober chucks, wafer tables, and end-effectors in which particles can cause die cracking.
Value of ITS Chuck Cleaning Wafer
Device manufacturers need high tool utilization to amortize high front-end factory costs
The ITS Chuck Cleaning Wafer is an effective processing tool to help customers: • Improve tool uptime • Reduce excursions due to contamination (increase yield) • Lower tool operating cost • Increase process kit life
ITS Chuck Cleaning Wafer is compatible with advanced wafer fab environments